Displacement Talbot Lithography 2019

Monday 11 November 2019 15:00 - 16:15
Published 2019-10-29 13:38 by Mariusz Graczyk

Actual achievements in Displacement Talbot Lithography will be presented.
Novel lift-off technology for DUV DTL.
Size reduction for A3B5-NW growth.
Base line - stability of process.
Application like; NIL stamps, Etched Si-NW, Linear grating transfer to the substrate.