Plasma Processing Workshop at Lund Nano Lab
On November 15-16, 2017 Lund Nano Lab (LNL) hosted a second joint LNL-Plasma-Therm Plasma Processing workshop. The Workshop focused on the fundamentals of plasma reactors, mechanisms of etching and deposition as applied to nanofabrication and covered state-of-the-art etching and deposition techniques. Dr. David Lishan (Plasma-Therm, USA) gave an overview of the modern plasma technologies for compound semiconductors, Si and dielectics. Two separate presentations described methods of end-point detection and plasma-enhanced chemical vapor deposition.
About 50 participants from universities and industry from Sweden, Norway, Denmark and Finland took part in the Workshop.
Contact person: Ivan Maximov