
Andreas Wacker
Professor

InAs nanowire metal-oxide-semiconductor capacitors
Author
Summary, in English
We present a capacitance-voltage study for arrays of vertical InAs nanowires. Metal-oxide-semiconductor (MOS) capacitors are obtained by insulating the nanowires with a conformal 10 nm HfO2 layer and using a top Cr/Au metallization as one of the capacitor's electrodes. The described fabrication and characterization technique enables a systematic investigation of the carrier density in the nanowires as well as of the quality of the MOS interface.
Department/s
- Solid State Physics
- Department of Electrical and Information Technology
- Mathematical Physics
Publishing year
2008
Language
English
Publication/Series
Applied Physics Letters
Volume
92
Issue
25
Full text
- Available as PDF - 590 kB
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Document type
Journal article
Publisher
American Institute of Physics (AIP)
Topic
- Condensed Matter Physics
Status
Published
Research group
- Linne Center for Nanoscience and Quantum Engineering
- Nano
ISBN/ISSN/Other
- ISSN: 0003-6951