Colloquium by Helmut Schift from PSI: Laser-based direct write lithography as a tool for 3D grayscale patterning

Dr. Helmut Schift, PSI, Switzerland will visit us and hold a colloquium.

Laser-based direct write lithography as a tool for 3D grayscale patterning

Abstract: Direct write lithography (DWL) is a versatile maskless lithography, and tools with reasonable throughput have been developed for fast prototyping and small scale production that allow for cost-efficient fabrication of microstructures. Apart from promising advances in DWL using two-photon absorption, the most common DWL tools are still those with non-intensity dependent material absorption (one-photon absorption) that are both used for binary and grayscale lithography. During two years of experiments with our new Heidelberg Instruments DWL 66+, we have patterned a multitude of structures from slopes, staircases, microlenses, and explored hybrid patterning schemes using DWL and nanoimprint lithography.
 
CV: Helmut Schift is researcher and group leader at the Paul Scherrer Institute (PSI) in Switzerland. He studied electrical engineering at the University of Karlsruhe, and performed his Ph.D. studies at the Institute of Microtechnology Mainz (IMM), Germany. He has been working in the field of Nanoimprint Lithography (NIL) since about 27 years. At PSI he was starting with the investigation of antiadhesive layers, went into squeeze flow and nanorheology, set-up processes for stamp copying and applied nanoimprint to a range of applications. Currently he is working on 3D lithography using direct laser writing, on glass molding and on cleaning procedures for metal waveguides for ITER. Besides his research, he is consultant for research integrity at PSI.

More about the speaker:

https://www.psi.ch/en/lnq/people/helmut-schift