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Claes Thelander

Claes Thelander

Associate Professor

Claes Thelander

Reduction of native oxides on InAs by atomic layer deposited Al2O3 and HfO2

Author

  • Rainer Timm
  • Fian Alexander
  • Martin Hjort
  • Claes Thelander
  • Erik Lind
  • Jesper N Andersen
  • Lars-Erik Wernersson
  • Anders Mikkelsen

Department/s

  • Synchrotron Radiation Research
  • Department of Physics
  • NanoLund: Center for Nanoscience

Publishing year

2010

Language

English

Publication/Series

Applied Physics Letters

Volume

97

Document type

Journal article (letter)

Publisher

American Institute of Physics (AIP)

Topic

  • Atom and Molecular Physics and Optics

Status

Published

Research group

  • Nano

ISBN/ISSN/Other

  • ISSN: 0003-6951