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Portrait of Ivan Maximov. Photo: Kennet Ruona

Ivan Maximov

Associate Professor, Coordinator Exploratory Nanotechnology

Portrait of Ivan Maximov. Photo: Kennet Ruona

Improving stamps for 10 nm level wafer scale nanoimprint lithography

Author

  • Marc Beck
  • Mariusz Graczyk
  • Ivan Maximov
  • Eva-Lena Sarwe
  • TGI Ling
  • M Keil
  • Lars Montelius

Summary, in English

The smaller the features on the stamp the more important are the interactions between stamp and polymer layer. A stamp rich in small structures will effectively show a surface area enlargement, which generally leads to adhesion of the polymer to the stamp. This makes a subsequent imprint impossible without troublesome and time-consuming cleaning. The anti-adhesion properties of Si- or SiO2-based stamps can be improved by binding fluorinated silanes covalently to the surface. In this paper, we demonstrate that the deposition procedure as well as the environment during deposition are important with respect to the quality and performance of the molecular layer. (C) 2002 Published by Elsevier Science B.V.

Department/s

  • Solid State Physics

Publishing year

2002

Language

English

Pages

441-448

Publication/Series

Microelectronic Engineering

Volume

61-2

Document type

Journal article

Publisher

Elsevier

Topic

  • Condensed Matter Physics

Keywords

  • nanoimprint lithography
  • stamp
  • fluorosilane
  • anti-adhesion

Status

Published

ISBN/ISSN/Other

  • ISSN: 1873-5568