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Portrait of Ivan Maximov. Photo: Kennet Ruona

Ivan Maximov

Associate Professor, Coordinator Exploratory Nanotechnology

Portrait of Ivan Maximov. Photo: Kennet Ruona

Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose

Author

  • Anette Löfstrand
  • Dmitry Suyatin
  • Nicklas Nilsson
  • Issei Otsuka
  • Anders Kvennefors
  • Johan Ring
  • Redouane Borsali
  • Ivan Maximov

Department/s

  • Solid State Physics
  • NanoLund

Publishing year

2019-10-16

Language

English

Document type

Poster

Conference name

5-th DSA Symposium

Conference date

2019-10-16 - 2019-10-18

Conference place

Milan, Italy

Status

Unpublished