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Portrait of Ivan Maximov. Photo: Kennet Ruona

Ivan Maximov

Associate Professor, Coordinator Exploratory Nanotechnology

Portrait of Ivan Maximov. Photo: Kennet Ruona

Sequential infiltration synthesis and pattern transfer using 6 nm half-pitch carbohydrate-based fingerprint block copolymer

Author

  • Anette Löfstrand
  • Reza Jafari Jam
  • Muhammad Mumtaz
  • Karolina Mothander
  • Tommy Nylander
  • Alexei Vorobiev
  • Ahibur Rahaman
  • Wen Chang Chen
  • Redouane Borsali
  • Ivan Maximov

Editor

  • Daniel P. Sanders
  • Douglas Guerrero

Summary, in English

This study presents how sequential infiltration synthesis of trimethyl aluminium and water into a carbohydrate-based block copolymer was used to enable pattern transfer of 6 nm half-pitch horizontal cylinders into silicon. Specular neutron reflectometry measurements of poly(styrene)-block-maltoheptaose self-assembled into horizontal cylinders indicate an increasing content of alumina after each sequential infiltration cycle, comparing 0, 1, 2, and 4 cycles, with alumina content reaching 2.4 vol% after four infiltrations cycles. Dry etching processes in inductively coupled plasma reactive ion etching for sub-10 nm patterns were developed, using a two-step technique: O2-plasma for polymer removal and a reactive ion etching of Si using a mixture of SF6 and C4F8 gases. Etch selectivity of more than 2:1 of silicon over alumina-like etch mask material was achieved. To evaluate the etching process, the etched Si structures were measured and characterized by scanning electron microscopy. These results are expected to be of use for nanofabrication and applications in the sub-10 nm regime.

Department/s

  • Solid State Physics
  • NanoLund
  • Physical Chemistry

Publishing year

2021

Language

English

Publication/Series

Proceedings of SPIE - The International Society for Optical Engineering

Volume

11612

Document type

Conference paper

Publisher

SPIE

Topic

  • Condensed Matter Physics

Keywords

  • Block copolymer
  • Carbohydrate
  • Pattern transfer
  • Sequential infiltration synthesis
  • Specular neutron reflectometry

Conference name

Advances in Patterning Materials and Processes XXXVIII 2020

Conference date

2021-02-22 - 2021-02-26

Conference place

Virtual, Online, United States

Status

Published

ISBN/ISSN/Other

  • ISSN: 0277-786X
  • ISSN: 1996-756X
  • ISBN: 9781510640573