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Portrait of Ivan Maximov. Photo: Kennet Ruona

Ivan Maximov

Associate Professor, Coordinator Exploratory Nanotechnology

Portrait of Ivan Maximov. Photo: Kennet Ruona

Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques

Author

  • Mariusz Graczyk
  • Andrea Cattoni
  • Benedikt Rösner
  • Gediminas Seniutinas
  • Anette Löfstrand
  • Anders Kvennefors
  • Dominique Mailly
  • Christian David
  • Ivan Maximov

Summary, in English

Single-digit nanometer patterning by nanoimprint lithography is a challenging task, which requires optimum stamp fabrication technique. In the current work, we present different strategies for technology of hard master stamps to make intermediate working stamps with sub-10 nm features. Methods of both negative and positive master stamps fabrication, based on EBL, RIE and ALD are described and compared. A single-step copying of negative master stamps using a polymer material is a preferred strategy to reach the ultra high-resolution. Lines as small as 5.6 nm are demonstrated in a resist using a combined thermal and UV-imprint with OrmoStamp material as a working stamp.

Department/s

  • Solid State Physics
  • NanoLund

Publishing year

2018-04-15

Language

English

Pages

73-78

Publication/Series

Microelectronic Engineering

Volume

190

Document type

Journal article

Publisher

Elsevier

Topic

  • Nano Technology
  • Other Electrical Engineering, Electronic Engineering, Information Engineering

Keywords

  • Nanoimprint
  • OrmoStamp
  • Pattern transfer
  • Stamp
  • Ultra-high resolution

Status

Published

ISBN/ISSN/Other

  • ISSN: 0167-9317