Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques
Summary, in English
Single-digit nanometer patterning by nanoimprint lithography is a challenging task, which requires optimum stamp fabrication technique. In the current work, we present different strategies for technology of hard master stamps to make intermediate working stamps with sub-10 nm features. Methods of both negative and positive master stamps fabrication, based on EBL, RIE and ALD are described and compared. A single-step copying of negative master stamps using a polymer material is a preferred strategy to reach the ultra high-resolution. Lines as small as 5.6 nm are demonstrated in a resist using a combined thermal and UV-imprint with OrmoStamp material as a working stamp.
- Nano Technology
- Other Electrical Engineering, Electronic Engineering, Information Engineering
- Pattern transfer
- Ultra-high resolution
- ISSN: 0167-9317