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Portrait of Ivan Maximov. Photo: Kennet Ruona

Ivan Maximov

Associate Professor, Coordinator Exploratory Nanotechnology

Portrait of Ivan Maximov. Photo: Kennet Ruona

Efficient methods of nanoimprint stamp cleaning based on imprint self-cleaning effect.

Author

  • Fantao Meng
  • Gang Luo
  • Ivan Maximov
  • Lars Montelius
  • Ye Zhou
  • Lars Nilsson
  • Patrick Carlberg
  • Babak Heidari
  • Jinkui Chu
  • Hongqi Xu

Summary, in English

Nanoimprint lithography (NIL) is a nonconventional lithographic technique that promises low-cost, high-throughput patterning of structures with sub-10 nm resolution. Contamination of nanoimprint stamps is one of the key obstacles to industrialize the NIL technology. Here, we report two efficient approaches for removal of typical contamination of particles and residual resist from stamps: thermal and ultraviolet (UV) imprinting cleaning-both based on the self-cleaning effect of imprinting process. The contaminated stamps were imprinted onto polymer substrates and after demolding, they were treated with an organic solvent. The images of the stamp before and after the cleaning processes show that the two cleaning approaches can effectively remove contamination from stamps without destroying the stamp structures. The contact angles of the stamp before and after the cleaning processes indicate that the cleaning methods do not significantly degrade the anti-sticking layer. The cleaning processes reported in this work could also be used for substrate cleaning.

Department/s

  • Solid State Physics
  • Department of Food Technology, Engineering and Nutrition
  • NanoLund

Publishing year

2011

Language

English

Publication/Series

Nanotechnology

Volume

22

Issue

18

Document type

Journal article

Publisher

IOP Publishing

Topic

  • Nano Technology

Status

Published

ISBN/ISSN/Other

  • ISSN: 0957-4484