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Portrait of Ivan Maximov. Photo: Kennet Ruona

Ivan Maximov

Associate Professor, Coordinator Exploratory Nanotechnology

Portrait of Ivan Maximov. Photo: Kennet Ruona

Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect

Author

  • Harry J Whitlow
  • May Ling Ng
  • Vaida Auzelyte
  • Ivan Maximov
  • Lars Montelius
  • JA van Kan
  • AA Bettiol
  • F Watt

Summary, in English

Metal electrode structures for biosensors with a high spatial density and similar to85 nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimal proximity exposure and straight proton trajectories in (similar to100 nm) resist layers for focused MeV proton beam writing are strongly indicative that ultimate electrode gap widths approaching a few nanometres are achievable.

Department/s

  • Nuclear physics
  • MAX IV Laboratory
  • Solid State Physics

Publishing year

2004

Language

Romanian

Pages

223-226

Publication/Series

Nanotechnology

Volume

15

Issue

1

Document type

Journal article

Publisher

IOP Publishing

Topic

  • Nano Technology

Status

Published

ISBN/ISSN/Other

  • ISSN: 0957-4484