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Portrait of Ivan Maximov. Photo: Kennet Ruona

Ivan Maximov

Associate Professor, Coordinator Exploratory Nanotechnology

Portrait of Ivan Maximov. Photo: Kennet Ruona

Quantative photoelectron spectromicroscopy for investigation of PMMA resist residues

Author

  • Alexei Zakharov
  • Ivan Maximov
  • T. Holmqvist
  • Lars Montelius
  • Ingolf Lindau

Summary, in English

We show that photoelectron spectroscopy (PES) due to its surface sensitivity can be used as a straightforward method to quantify the PMMA resist residues which remain on SiO<sub>2</sub> surfaces after electron beam exposure and resist development. The attenuation of the SiO<sub>2</sub> valence band and Si2p photoelectrons has been measured by using a photoelectron microscope and it has been found that correctly exposed and developed PMMA resist leaves residues with an average thickness of about 0.7 nm. Higher exposure doses result in decrease of the film thickness, but still with residues of about 0.5 nm. The technique can be applied as a powerful tool for surface and interface quality control in technology of electronic devices

Department/s

  • MAX IV Laboratory
  • Solid State Physics

Publishing year

2002

Language

English

Publication/Series

7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science

Document type

Conference paper

Publisher

Lund University

Topic

  • Natural Sciences
  • Condensed Matter Physics
  • Physical Sciences

Keywords

  • Si2p photoelectrons
  • film thickness
  • SiO<sub>2</sub> valence band
  • electron beam exposure
  • SiO<sub>2</sub> surfaces
  • surface sensitivity
  • photoelectron spectromicroscopy
  • PMMA resist residues
  • attenuation
  • electronic devices technology
  • 0.7 nm
  • 0.5 nm
  • SiO<sub>2</sub>-Si
  • SiO<sub>2</sub>

Conference name

Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)

Conference date

2002-06-24 - 2002-06-28

Conference place

Malmö, Sweden

Status

Published