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Portrait of Ivan Maximov. Photo: Kennet Ruona

Ivan Maximov

Associate Professor, Coordinator Exploratory Nanotechnology

Portrait of Ivan Maximov. Photo: Kennet Ruona

Polymer stamps for nanoimprinting

Author

  • K Pfeiffer
  • M Fink
  • G Ahrens
  • G Gruetzner
  • F Reuther
  • J Seekamp
  • S Zankovych
  • CMS Torres
  • Ivan Maximov
  • Marc Beck
  • Mariusz Graczyk
  • Lars Montelius
  • H Schulz
  • HC Scheer
  • F Steingrueber

Summary, in English

Stamp fabrication for nanoimprinting can be significantly simplified, when specialized crosslinking polymers are applied to pattern definition. The polymer patterns can be used as stamps themselves. Two possibilities are reported: (1) An e-beam sensitive resist was developed, which enables the fabrication of polymer-on-silicon stamps. Patterns with a feature size of 70 nm could be created. (2) Full plastic stamps were obtained by a casting-moulding technique, which enable pattern transfer from any conventional mould. The quality of the two stamp variants were proved by imprinting experiments. (C) 2002 Elsevier Science B.V. All rights reserved.

Department/s

  • Solid State Physics

Publishing year

2002

Language

English

Pages

393-398

Publication/Series

Microelectronic Engineering

Volume

61-2

Document type

Journal article

Publisher

Elsevier

Topic

  • Condensed Matter Physics

Keywords

  • crosslinked polymers
  • nanoimprint lithography
  • stamp fabrication
  • e-beam resist

Status

Published

ISBN/ISSN/Other

  • ISSN: 1873-5568