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Portrait of Ivan Maximov. Photo: Kennet Ruona

Ivan Maximov

Associate Professor, Coordinator Exploratory Nanotechnology

Portrait of Ivan Maximov. Photo: Kennet Ruona

Fabrication and characterization of bilayer metal wire-grid polarizer using nanoimprint lithography on flexible plastic substrate

Author

  • Fantao Meng
  • Gang Luo
  • Ivan Maximov
  • Lars Montelius
  • Jinkui Chu
  • Hongqi Xu

Summary, in English

In this work, we demonstrate the fabrication of bilayer metal wire-grid polarizers and the characterization of their performance. The polarizers with 200 nm period were fabricated on flexible plastic substrates by nanoimprint lithography (NIL), followed by aluminum deposition. Transmission efficiency over 0.51 and extinction ratio higher than 950 can be achieved in the visible range when the aluminum thickness of the polarizer is 100 nm. The fabrication process only involves direct imprinting on flexible plastic substrates and aluminum deposition, without any resist spin-coating, lift-off, and etching processes, which is much simpler, less costly, and applicable to large volume production. (C) 2011 Elsevier B.V. All rights reserved.

Department/s

  • Solid State Physics
  • NanoLund

Publishing year

2011

Language

English

Pages

3108-3112

Publication/Series

Microelectronic Engineering

Volume

88

Issue

10

Document type

Journal article

Publisher

Elsevier

Topic

  • Condensed Matter Physics

Keywords

  • Bilayer wire-grid polarizer
  • Nanoimprint lithography
  • Flexible plastic
  • substrate
  • TM transmission
  • Extinction ratio

Status

Published

ISBN/ISSN/Other

  • ISSN: 1873-5568