Your browser has javascript turned off or blocked. This will lead to some parts of our website to not work properly or at all. Turn on javascript for best performance.

The browser you are using is not supported by this website. All versions of Internet Explorer are no longer supported, either by us or Microsoft (read more here: https://www.microsoft.com/en-us/microsoft-365/windows/end-of-ie-support).

Please use a modern browser to fully experience our website, such as the newest versions of Edge, Chrome, Firefox or Safari etc.

Portrait of Ivan Maximov. Photo: Kennet Ruona

Ivan Maximov

Associate Professor, Coordinator Exploratory Nanotechnology

Portrait of Ivan Maximov. Photo: Kennet Ruona

Fabrication of Si-based nanoimprint stamps with sub-20 nm features

Author

  • Ivan Maximov
  • Eva-Lena Sarwe
  • Marc Beck
  • Knut Deppert
  • Mariusz Graczyk
  • Martin Magnusson
  • Lars Montelius

Summary, in English

We present two alternative methods for fabrication of nanoimprint lithography stamps in SiO2 with sub-20 nm features: (a) optimized electron beam lithography (EBL) and lift-off patterning of a 15-nm thick Cr mask, and (b) aerosol deposition of W particles in the 20-nm size range. In both cases, the pattern transfer into SiO2 was performed using reactive ion etching (RIE) with CHF3 as etch gas. In the first approach, we used a double layer resist system (PMMA/ZEP 520A7 positive resists) for the EBL exposure. Resist thickness, exposure dose and development time were optimized to obtain 15-20 nm features after Cr lift-off. In the second approach, we used size selected W aerosol particles as etch masks during etching of SiO2. Both methods of stamp fabrication are compared and discussed. (C) 2002 Published by Elsevier Science B.V.

Department/s

  • Solid State Physics

Publishing year

2002

Language

English

Pages

449-454

Publication/Series

MICROELECTRONIC ENGINEERING

Volume

61-2

Document type

Conference paper

Publisher

Elsevier

Topic

  • Condensed Matter Physics

Keywords

  • aerosols
  • electron beam lithography
  • nanoimprint
  • etching

Conference name

Micro and Nano Engineering 2001

Conference date

2001-09-16 - 2001-09-19

Status

Published

ISBN/ISSN/Other

  • ISSN: 1873-5568
  • ISSN: 0167-9317